Magnetic switching in 100 nm patterned pseudo spin valves

被引:16
作者
Castaño, FJ
Hao, Y
Haratani, S
Ross, CA
Vögeli, B
Walsh, M
Smith, HI
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[3] TDK Corp, Ctr Tech, Chiba, Japan
关键词
interference lithography; MRAM; nanomagnet array; PSV; single-domain particle;
D O I
10.1109/20.951057
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Progress in developing operative high-density magnetoresistive random access memory (MRAM) devices relies critically on tailoring the magnetic switching occurring in arrays of small patterned pseudo spin valve (PSV) elements. Co/Cu/NiFe PSV films, produced by sputtering in the presence of a magnetic field, have an in-plane anisotropy and switching fields of typically 10 Oe for the soft NiFe and 40 Oe for the hard Co. These films were patterned into arrays of elliptical and circular elements with dimensions of 80 nm to 10 mum. The layered structure in these large-area arrays of compositionally modulated PSV elements is preserved through the patterning processes. Hysteresis measurements of the dot arrays show that the switching field of the hard layer increases significantly with decreasing element size, reaching 600 Oe for the smallest elements. Additionally, in patterned elements the soft layer switches prior to field reversal due to magnetostatic coupling between the layers, leading to antiparallel alignment at remanence.
引用
收藏
页码:2073 / 2075
页数:3
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