Fabrication of carbon-based field emitters using stamp technology

We propose and demonstrate stamp technology, a novel processing technique for a field electron emitter, in which emitter tips are fabricated by pressing a mold into a spin-coated organic material to completely transform the shape of the mold. The material is then modified by ion irradiation to produce a carbon-based emitter material. Starting materials tested were a high-temperature-cured polyimide and a photoresist (novolac resin). The shape of the mold can be completely transferred to these materials at pressure over 700 MPa at 250 degreesC. A held-emission current up to the order of muA is obtained from emitters fabricated by this new technology with modification using Ar-ion irradiation at an energy of 100keV to a dose of 3 x 10(16) cm(-2). The ion-beam-irradiation effect on polyimide and photoresist materials is also investigated in terms of electrical conductivity and chemical bonds.