Viscous flow and MOS properties of MgF2-B2O3-GeO2-SiO2 glasses with ionic bonds

被引:2
作者
Kobayashi, K
机构
[1] Toshiba ULSI Research Center, Kawasaki
关键词
D O I
10.1007/BF01021981
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
[No abstract available]
引用
收藏
页码:551 / 553
页数:3
相关论文
共 19 条
[1]  
BARET G, 1991, J ELECTROCHEM SOC, V138, P2835
[2]   HYDROGEN-CONTAINING GLASS AND GAS-CERAMIC MICROFOAMS - RAMAN, XPS-NMR, AND MAS-NMR RESULTS ON THE STRUCTURE OF PRECURSOR SIO2-B2O3-P2O5 GLASSES [J].
DICKINSON, JE ;
DEJONG, BHWS ;
SCHRAMM, CM .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1988, 102 (1-3) :196-204
[3]   THE DIPOLE MOMENT OF HYDROGEN FLUORIDE AND THE IONIC CHARACTER OF BONDS [J].
HANNAY, NB ;
SMYTH, CP .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1946, 68 (02) :171-173
[4]  
HURLEY KH, 1987, SOLID STATE TECH MAR, P103
[5]   PASSIVATION AND VLSI PACKAGING GLASSES WITH LOW FLOW POINTS [J].
KOBAYASHI, K .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1986, 88 (2-3) :229-235
[6]   FLOW POINTS AND REFLOW IN ALKOXIDE GLASSES [J].
KOBAYASHI, K .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1993, 159 (03) :274-276
[7]  
KOBAYASHI K, 1989, GLASS TECHNOL, V30, P110
[8]  
KOBAYASHI K, 1988, GLASS TECHNOL, V29, P253
[10]  
KOBAYASHI K, 1993, GLASS TECHNOL, V34, P120