Ion flux nonuniformities in large-area high-frequency capacitive discharges

被引：136

作者：

Perret, A ^{[1
]}

Chabert, P ^{[1
]}

Booth, JP ^{[1
]}

Jolly, J ^{[1
]}

Guillon, J ^{[1
]}

Auvray, P ^{[1
]}

机构：

[1] Ecole Polytech, Lab Phys & Technol Plasmas, UMR 7648, F-91128 Palaiseau, France

来源：

APPLIED PHYSICS LETTERS | 2003年 / 83卷 / 02期

关键词：

D O I：

10.1063/1.1592617

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Strong nonuniformities of plasma production are expected in capacitive discharges if the excitation wavelength becomes comparable to the reactor size (standing-wave effect) and/or if the plasma skin depth becomes comparable to the plate separation (skin effect) [M. A. Lieberman , Plasma Sources Sci. Technol. 11, 283 (2002)]. Ion flux uniformity measurements were carried out in a large-area square (40 cmx40 cm) capacitive discharge driven at frequencies between 13.56 MHz and 81.36 MHz in argon gas at 150 mTorr. At 13.56 MHz, the ion flux was uniform to +/-5%. At 60 MHz (and above) and at low rf power, the standing-wave effect was seen (maximum of the ion flux at the center), in good quantitative agreement with theory. At higher rf power, maxima of the ion flux were observed at the edges, due either to the skin effect or to other edge effects. (C) 2003 American Institute of Physics.

引用

页码：243 / 245

页数：3