Friction effects in atomic force microscopy of patterned octadecyltriethoxysilane-on-glass self-assembled monolayers

被引：37

作者：

Lee, BW ^{[1
]}

Clark, NA ^{[1
]}

机构：

[1] Univ Colorado, Dept Phys, Condensed Matter Lab, Boulder, CO 80309 USA

来源：

LANGMUIR | 1998年 / 14卷 / 19期

关键词：

D O I：

10.1021/la970217f

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We present a quantitative study of the simultaneous effects of surface topography and friction in atomic force microscopic imaging of octadecyltriethoxysilane-on-glass self-assembled monolayers, patterned by illumination with ultraviolet radiation through a mask. The ultraviolet light leaves a similar to 1 nm deep topographic depression in the exposed areas, and produces larger surface-tip friction which can be the dominant contribution to the apparent topography.

引用

页码：5495 / 5501

页数：7

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