Effects of sample thickness on the van der Pauw technique for resistivity measurements

被引:52
作者
Kasl, C [1 ]
Hoch, MJR
机构
[1] Univ Witwatersrand, Sch Phys, ZA-2050 Wits, South Africa
[2] Univ Witwatersrand, Mat Phys Res Inst, ZA-2050 Wits, South Africa
基金
新加坡国家研究基金会;
关键词
D O I
10.1063/1.1866232
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The van der Pauw technique is commonly used for electrical transport measurements on solid materials and is suited to thin, arbitrarily shaped samples, with the contacts placed anywhere on the periphery. Previous investigations have determined the effects of sample shape, contact size, and contact placement on the accuracy of this technique. Sample inhomogeneity effects have also been investigated. The effects of the sample thickness appear not to have been previously studied and are investigated here in order to establish precisely what is meant by a thin sample. The deterioration in the accuracy of the technique is followed as the sample thickness is increased. The results indicate that the van der Pauw technique may be used for samples where the thickness is comparable to the surface dimensions. The investigation also shows that the technique is valid for arbitrarily thick samples provided that low resistance electrodes are placed across the entire edge, perpendicular to the surface, in order to maintain an effective two-dimensional current distribution. This finding is useful for transport measurements on materials that have been prepared, for example, by solid state reaction using sintering methods. (C) 2005 American Institute of Physics.
引用
收藏
页数:4
相关论文
共 11 条
[1]   MEASUREMENT OF HIGH-RESISTIVITY SEMICONDUCTORS USING VANDERPAUW METHOD [J].
HEMENGER, PM .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1973, 44 (06) :698-700
[2]   HALL-EFFECT NEAR THE METAL-INSULATOR-TRANSITION [J].
KOON, DW ;
CASTNER, TG .
PHYSICAL REVIEW B, 1990, 41 (17) :12054-12070
[3]   Direct measurement of the resistivity weighting function [J].
Koon, DW ;
Chan, WK .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (12) :4218-4220
[5]   MEASUREMENT OF CONTACT PLACEMENT ERRORS IN THE VANDERPAUW TECHNIQUE [J].
KOON, DW ;
BAHL, AA ;
DUNCAN, EO .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1989, 60 (02) :275-276
[6]   Effects of macroscopic inhomogeneities on resistive and Hall measurements on crosses, cloverleafs, and bars [J].
Koon, DW ;
Knickerbocker, CJ .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1996, 67 (12) :4282-4285
[7]   Resistive and Hall weighting functions in three dimensions [J].
Koon, DW ;
Knickerbocker, CJ .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (10) :3625-3627
[8]   LOW-TEMPERATURE ELECTRICAL-CONDUCTIVITY OF TA-COMPENSATED SODIUM BRONZE NEAR THE METAL-INSULATOR-TRANSITION [J].
RAYCHAUDHURI, AK .
PHYSICAL REVIEW B, 1991, 44 (16) :8572-8577
[9]   Thermoelectric, transport, and magnetic properties of the polaron semiconductor FexCr3-xSe4 [J].
Snyder, GJ ;
Caillat, T ;
Fleurial, JP .
PHYSICAL REVIEW B, 2000, 62 (15) :10185-10193
[10]  
Van der Pauw L. J., 1958, PHILLIPS TECHNICAL R, V20, P220, DOI DOI 10.4236/JMP.2013.411179