Double bias HFCVD multilayer diamond films on WC-Co cutting tools

被引:32
作者
Vojs, M
Vesely, M
Redhammer, R
Janík, J
Kadlecíková, M
Danis, T
Marton, M
Michalka, M
Sutta, P
机构
[1] Slovak Univ Technol Bratislava, Fac Elect Engn & Informat Technol, Bratislava 81219, Slovakia
[2] Ctr Int Laser, Bratislava 81219, Slovakia
[3] Univ W Bohemia, Plzen 30614, Czech Republic
关键词
diamond film; hot filament CVD; morphology; cutting tools;
D O I
10.1016/j.diamond.2005.01.006
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diamond layers are nowadays of increasing importance for mechanical applications. In our laboratory we grow diamond and DLC layers on WC-Co cutting tools using HF CVD method improved by double biasing. Optimization of growth parameters facilitates to control grain size of polycrystalline diamond layers from microcrystalline to nanocrystalline. Five steps of this process are described and demonstrated. SEM, AFM, Raman spectroscopy, and XRD were used to analyze grown diamond films. The decrease of the RMS surface roughness from 650 nm down to 50 nm was measured. Bias voltage was demonstrated to be the tool for changing the grown layer grain size. Deposition rates were increased to optimal values. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:613 / 616
页数:4
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