Surface states and surface oxide in GaN layers

被引:83
作者
Shalish, I
Shapira, Y
Burstein, L
Salzman, J
机构
[1] Tel Aviv Univ, Dept Elect Engn Phys Elect, IL-69978 Tel Aviv, Israel
[2] Tel Aviv Univ, Wolfson Appl Mat Res Ctr, IL-69978 Tel Aviv, Israel
[3] Technion Israel Inst Technol, Dept Elect Engn, IL-32000 Haifa, Israel
[4] Technion Israel Inst Technol, Inst Solid State, IL-32000 Haifa, Israel
[5] Technion Israel Inst Technol, Microelect Res Ctr, IL-32000 Haifa, Israel
关键词
D O I
10.1063/1.1330553
中图分类号
O59 [应用物理学];
学科分类号
摘要
Surface photovoltage spectroscopy, photoluminescence, Auger electron spectroscopy and x-ray photoelectron spectroscopy were used to correlate the chemical changes induced by HCl etching of GaN surface to changes in the yellow luminescence related states, through their manifestation in surface photovoltage. The results show a correlation between a removal of the gallium oxide from the surface and a reduction of the yellow luminescence related transition in the surface photovoltage spectra. Based on this observation, it is suggested that the well known yellow luminescence is emitted from surface states associated with the gallium oxide that decorates the free surface and possibly also the substrate interface and internal grain boundaries. (C) 2001 American Institute of Physics.
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收藏
页码:390 / 395
页数:6
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