Metal electrodeposition on self-assembled monolayers: a versatile tool for pattern transfer on metal thin films

被引:52
作者
Azzaroni, O [1 ]
Schilardi, PL [1 ]
Salvarezza, RC [1 ]
机构
[1] Univ Nacl La Plata, CONICET, INIFTA, RA-1900 La Plata, Argentina
关键词
alkanethiolate self assembled monolayers; metal electrodeposition; nano/microfabrication; molding and replication;
D O I
10.1016/S0013-4686(03)00388-8
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Self-assembled monolayers (SAMs) of thiols on metals have attracted considerable scientific interest because their vide range of applications including their potential use for serial fabrication of nano/microstructures. Different methods have been proposed involving SAM patterning by different techniques. The patterned SAM is then used as a resist for etching, deposition on the uncovered regions or for self-assembly on the patterned SAM Surface. In this work new applications of SAM-covered metals based on their excellent anti-adherent properties and their ability to allow pattern transfer front it metallic Substrate to metal or alloy electrodeposits Lire presented. We have used electrodeposition on SAM-covered electrodes to prepare thin standing-free metal or alloy films, for patterning metal and alloy surfaces in the micro- and meso- scale. and to fabricate metallic molds and replicas of metallic masters. The SAM-covered molds produced by this technique can also be used for patterning soft and rigid polymeric films. The method is fast, inexpensive and requires only basic instrumentation available at any chemical laboratory. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码:3107 / 3114
页数:8
相关论文
共 33 条
[21]   Dynamic scaling exponents of copper electrodeposits from scanning force microscopy imaging. Influence of a thiourea additive on the kinetics of roughening and brightening [J].
Mendez, S ;
Andreasen, G ;
Schilardi, P ;
Figueroa, M ;
Vazquez, L ;
Salvarezza, RC ;
Arvia, AJ .
LANGMUIR, 1998, 14 (09) :2515-2524
[22]   Evolution of the growth front for copper electrodeposition followed by real time imaging [J].
Schilardi, P ;
Mendez, S ;
Salvarezza, RC ;
Arvia, AJ .
LANGMUIR, 1998, 14 (15) :4308-4314
[23]   Stable interface dynamics for copper electrodeposition in the presence of organic additives: Evidence for a gas-like surface state of the organic adsorbate [J].
Schilardi, PL ;
Azzaroni, O ;
Salvarezza, RC .
PHYSICAL REVIEW B, 2000, 62 (19) :13098-13103
[24]   A novel application of alkanethiol self-assembled monolayers in nanofabrication: Direct molding and replication of patterned conducting masters [J].
Schilardi, PL ;
Azzaroni, O ;
Salvarezza, RC .
LANGMUIR, 2001, 17 (09) :2748-2752
[25]   Structure and growth of self-assembling monolayers [J].
Schreiber, F .
PROGRESS IN SURFACE SCIENCE, 2000, 65 (5-8) :151-256
[26]   Electrodeposited ceramic single crystals [J].
Switzer, JA ;
Shumsky, MG ;
Bohannan, EW .
SCIENCE, 1999, 284 (5412) :293-296
[27]   ELECTRODEPOSITED CERAMIC SUPERLATTICES [J].
SWITZER, JA ;
SHANE, MJ ;
PHILLIPS, RJ .
SCIENCE, 1990, 247 (4941) :444-446
[28]   Electrodeposition of quantum-confined metal semiconductor nanocomposites [J].
Switzer, JA ;
Hung, CJ ;
Bohannan, EW ;
Shumsky, MG ;
Golden, TD ;
VanAken, DC .
ADVANCED MATERIALS, 1997, 9 (04) :334-&
[29]   Following transformation in self-assembled alkanethiol monolayers on Au(111) by in situ scanning tunneling microscopy [J].
Vericat, C ;
Andreasen, G ;
Vela, ME ;
Martin, H ;
Salvarezza, RC .
JOURNAL OF CHEMICAL PHYSICS, 2001, 115 (14) :6672-6678
[30]   Sulfur-substrate interactions in spontaneously formed sulfur adlayers on Au(111) [J].
Vericat, C ;
Vela, ME ;
Andreasen, G ;
Salvarezza, RC ;
Vázquez, L ;
Martín-Gago, JA .
LANGMUIR, 2001, 17 (16) :4919-4924