Raman study of electric-field-induced first-order metal-insulator transition in VO2-based devices -: art. no. 242101

被引:286
作者
Kim, HT [1 ]
Chae, BG
Youn, DH
Kim, G
Kang, KY
Lee, SJ
Kim, K
Lim, YS
机构
[1] Elect & Telecommun Res Inst, Basic Res Lab, Taejon 305350, South Korea
[2] Seoul Natl Univ, Sch Chem, Seoul 151742, South Korea
[3] Konkuk Univ, Dept Appl Phys, Chungju 380701, South Korea
关键词
D O I
10.1063/1.1941478
中图分类号
O59 [应用物理学];
学科分类号
摘要
An abrupt first-order metal-insulator transition (MIT) as a current jump has been observed by applying a dc electric field to Mott insulator VO2-based two-terminal devices. The size of the jumps was measured to be asymmetrical depending on the direction of the applied voltage due to heating effects. The structure of VO2 is investigated by micro-Raman scattering experiments. An analysis of the Raman-active A(g) modes at 195 and 222 cm(-1), explained by pairing and tilting of V cations, and 622 cm(-1), shows that the modes below a low compliance (restricted) current do not change when the MIT occurs, whereas a structural phase transition above the low compliance current is found to occur secondarily, due to heating effects in the device induced by the MIT. The MIT has applications in the development of high-speed and high-gain switching devices. (c) 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
相关论文
共 15 条
[1]   Femtosecond laser excitation dynamics of the semiconductor-metal phase transition in VO2 [J].
Becker, MF ;
Buckman, AB ;
Walser, RM ;
Lepine, T ;
Georges, P ;
Brun, A .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (05) :2404-2408
[2]   Evidence for a structurally-driven insulator-to-metal transition in VO2:: A view from the ultrafast timescale -: art. no. 161102 [J].
Cavalleri, A ;
Dekorsy, T ;
Chong, HHW ;
Kieffer, JC ;
Schoenlein, RW .
PHYSICAL REVIEW B, 2004, 70 (16) :1-4
[3]   Femtosecond structural dynamics in VO2 during an ultrafast solid-solid phase transition -: art. no. 237401 [J].
Cavalleri, A ;
Tóth, C ;
Siders, CW ;
Squier, JA ;
Ráksi, F ;
Forget, P ;
Kieffer, JC .
PHYSICAL REVIEW LETTERS, 2001, 87 (23) :237401-1
[4]  
Chae BG, 2004, J KOREAN PHYS SOC, V44, P884
[5]   Metal-insulator transitions [J].
Imada, M ;
Fujimori, A ;
Tokura, Y .
REVIEWS OF MODERN PHYSICS, 1998, 70 (04) :1039-1263
[6]   Mechanism and observation of Mott transition in VO2-based two- and three-terminal devices -: art. no. 052 [J].
Kim, HT ;
Chae, BG ;
Youn, DH ;
Maeng, SL ;
Kim, G ;
Kang, KY ;
Lim, YS .
NEW JOURNAL OF PHYSICS, 2004, 6
[7]   Universality and critical behavior at the Mott transition [J].
Limelette, P ;
Georges, A ;
Jérome, D ;
Wzietek, P ;
Metcalf, P ;
Honig, JM .
SCIENCE, 2003, 302 (5642) :89-92
[8]   MOTT TRANSITION IN CR-DOPED V2O3 [J].
MCWHAN, DB ;
RICE, TM ;
REMEIKA, JP .
PHYSICAL REVIEW LETTERS, 1969, 23 (24) :1384-+
[9]   OXIDES WHICH SHOW A METAL-TO-INSULATOR TRANSITION AT THE NEEL TEMPERATURE [J].
MORIN, FJ .
PHYSICAL REVIEW LETTERS, 1959, 3 (01) :34-36
[10]  
Mott N.F., 1990, METAL INSULATOR TRAN