Vapor-phase adsorption kinetics of 1-decene on H-terminated Si(100)

We have investigated in situ and in real time vapor-phase self-assembly of 1-decene on Si, using attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIRS). The adsorption of 1-decene on hydrogenated Si(100) results in a decane-terminated hydrophobic surface, indicated by the sessile-drop water contact angle at 107 +/- 2degrees. This maximum contact angle is achieved at 160 degreesC under 30 mTorr of vapor-phase 1-decene. The fractional surface coverage of decane, calculated from the IR absorbance of C-H stretching vibrational modes near 2900 cm(-1), follows a Langmuir isotherm. The absolute surface coverage calculated from the IR absorbance saturates at 3.2 x 10(14) cm(-2). On the basis of this isotherm, the empirical rate constant (k'(2)) that governs the rate-limiting step in 1-decene adsorption on HF-treated Si(100) is (3.3 +/- 0.7) x 10(-2) min(-1). The thickness and cant angle of the decane monolayer at the saturation coverage are calculated from angle resolved X-ray photoelectron spectroscopy (AR-XPS). The calculated thickness ranges from 8.4 to 18 Angstrom due to the uncertainty in the attenuation lengths of C(1s) and Si(2p) photoelectrons through the decane layer. For the same uncertainty, the calculated cant angle ranges from 0 to 55degrees. Spectroscopic ellipsometry is independently used to approximate the film thickness at 16 Angstrom. Monitoring the decane monolayer over a period of 50 days using AR-XPS indicates that the Si surface underneath the decane monolayer gets oxidized with time, leading to the degradation of the decane layer.