Crystallinity of titania thin films deposited by light induced chemical vapor deposition

被引:30
作者
Halary, E
Haro-Poniatowski, E
Benvenuti, G
Hoffmann, P [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Swiss Fed Inst Technol, BM, Inst Appl Opt, CH-1015 Lausanne, Switzerland
[2] Univ Autonoma Metropolitana Iztapalapa, Dept Fis, Mexico City 55534, DF, Mexico
关键词
titanium dioxide; CVD; excimer laser; titanium tetraisopropoxide (CAS : 546-68-9); photo-deposition;
D O I
10.1016/S0169-4332(00)00849-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Titanium dioxide thin films were deposited from titanium tetraisopropoxide in an oxygen atmosphere by light induced chemical vapor deposition (LICVD), using a 308 nm XeCl excimer laser We report on the influence of substrate holder temperature at a low fluence (150 mJ/cm(2)) on the deposition on glass substrates. The growth rate follows an Arrhenius behavior between 120 and 210 degreesC, corresponding to an activation energy of the deposition reaction of 20 kJ/mol. XRD and Raman spectroscopy detected a mixture of anatase and rutile crystals, possibly in an amorphous material. With increasing substrate temperature, the crystallinity is enhanced and the ratio, anatase/rutile increases. (C) 2000 published by Elsevier Science B.V.
引用
收藏
页码:61 / 65
页数:5
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