Dissociative excitation reaction of CH3CN with the discharge flow of Ar:: Prediction of the [N]/([N] plus [C]) ratio of hydrogenated amorphous carbon nitride films in the desiccated system

被引：6

作者：

Ito, H ^{[1
]}

Miki, H ^{[1
]}

Namiki, KC ^{[1
]}

Ito, N ^{[1
]}

Saitoh, H ^{[1
]}

机构：

[1] Nagaoka Univ Technol, Dept Chem, Nagaoka, Niigata 9402188, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2003年 / 42卷 / 6A期

关键词：

emission spectroscopy; hydrogenated amorphous carbon nitride; CH radical; CN radical; CH3CN;

D O I：

10.1143/JJAP.42.3684

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Emission spectra of the CN(B(2)Sigma+ -X(2)Sigma(+)) and CH(A(2)Delta-X(2)Pi) transitions were observed in the dissociative excitation reaction of CH3CN with the microwave-discharge flow of Ar. The H2O molecules contained in the starting materials and adsorbed on the wall of the apparatus were removed by using P2O5 as a desiccant. The pressure of Ar, P-Ar, was in the range of 0.1-1.0 Torr. The ratio of the concentrations of the CH(A(2)Delta) and CN(B(2)Sigma(+)) states, N-CH(A)/N-CN(B), in the desiccated system was found to be smaller than that in the system without desiccation. The [N]/([N]+[C]) ratio of the a-CNx:H films formed in the desiccated system was predicted to be approximate to0.18, being nearly independent Of P-Ar.

引用

页码：3684 / 3685

页数：2

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