Orientation control and electrical properties of sputtered Pb(Zr,Ti)O3 films

被引:31
作者
Lee, JY
Lee, BS [1 ]
机构
[1] Jeonbuk Natl Univ, Div Adv Mat Engn, Chonju 561756, South Korea
[2] Jeonbuk Natl Univ, Semicond Phys Res Ctr, Dept Semicond Sci & Technol, Chonju 561756, South Korea
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2001年 / 79卷 / 01期
关键词
Pb(Zr; Ti)O-3; sputtering; RTA; atomic mobility; hysteresis loop; C-E curve;
D O I
10.1016/S0921-5107(00)00555-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Relationship between the crystallographic orientation and the electrical properties of the Pb(Zr,Ti)O-3. (PZT) thin films prepared by rf magnetron sputtering was investigated. The PZT films were deposited at 150. 250 or 340 degreesC and, followed by rapid thermal annealing (RTA). It was found that the crystallographic orientation of the PZT films could be controlled only by the deposition temperature and the ferroelectric properties were dependent upon the orientation of the films. It was suggested that the difference in the atomic mobility at the substrate surface during deposition was closely related to the film orientation. The films with (111) orientation showed relatively high capacitance and the remanant polarization values. (C) 2001 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:86 / 89
页数:4
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