Effects of Sputtering Gas Pressure on Electrochromic Properties of Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering in H2O Atmosphere

被引：17

作者：

Abe, Yoshio ^{[1
]}

Ueta, Hideaki ^{[1
]}

Obata, Takeshi ^{[1
]}

Kawamura, Midon ^{[1
]}

Sasaki, Katsutaka ^{[1
]}

Itoh, Hidenobu ^{[1
]}

机构：

[1] Kitami Inst Technol, Dept Mat Sci & Engn, Kitami, Hokkaido 0908507, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2010年 / 49卷 / 11期

关键词：

NICKEL-OXIDE FILMS; SOL-GEL; DISCHARGE;

D O I：

10.1143/JJAP.49.115802

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Ni oxyhydroxide (NiOOH) thin films were prepared by reactive sputtering in an atmosphere of H2O gas and the effects of sputtering gas pressure on their electrochromic properties in KOH aqueous electrolyte were studied The largest optical density change was obtained for the thin films deposited under high sputtering gas pressures of approximately 6 7 Pa because of their low film density and chemical composition close to NiOOH Stable transmittance change during coloring and bleaching cycles was obtained for the film from the first cycle up to 100 cycles (C) 2010 The Japan Society of Applied Physics

引用

页数：4

共 23 条

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