Recent progress of patterned media

被引：31

作者：

Kikitsu, Akira ^{[1
]}

Kamata, Yoshiyuki ^{[1
]}

Sakurai, Masatoshi ^{[1
]}

Naito, Katsuyuki ^{[1
]}

机构：

[1] Toshiba Co Ltd, Corp R&D Ctr, Kanagawa 2128582, Japan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2007年 / 43卷 / 09期

关键词：

magnetic recording medium; nano-imprint lithography; patterned media;

D O I：

10.1109/TMAG.2007.902970

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Recent progress in the development of patterned magnetic recording media is presented, focusing on the results of patterned media fabricated by a self-assembled mask process. Several issues such as fabrication process, flyability, and signal processing have been discussed so far. However, recent progress, seems to resolve these problems. A fabrication process using nano-imprint lithography is a possible solution in terms of productivity. Good results for flyability have been reported for discrete track recording media. Certain advantages with respect to signal processing have been reported. Although problems remain to be resolved, patterned media is expected to be commercialized following the introduction of the discrete track media, as a high density perpendicular magnetic recording media.

引用

页码：3685 / 3688

页数：4

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