2.5-inch disk patterned media prepared by an artificially assisted self-assembling method

被引:251
作者
Naito, K [1 ]
Hieda, H
Sakurai, M
Kamata, Y
Asakawa, K
机构
[1] Toshiba Co Ltd, Ctr Corp Res & Dev, Storage Mat & Devices Lab, Kawasaki, Kanagawa 210, Japan
[2] Toshiba Co Ltd, Ctr Corp Res & Dev, Adv Mat & Devices Lab, Kawasaki, Kanagawa 2128582, Japan
关键词
diblock copolymer; ion milling; magnetic nanostructures; nanoimprint; patterned media; self-assembling;
D O I
10.1109/TMAG.2002.802847
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Circumferential magnetic patterned media were prepared on a 2.5-inch-diameter glass plate and on a 3-in-diameter silicon plate. A Ni master disk possessing spiral patterns with 60-250-nni-width lands and a 400-nm-width groove was pressed into a resist film on a CoPt or CoCrPt film to transfer the spiral patterns. A diblock copolymer solution was cast into the obtained grooves and then annealed to prepare self-assembling dot structures aligned along the grooves. According to the dot patterns, the underlying magnetic films were patterned by ion milling to yield patterned media with a 40-nm diameter. Coercive forces and squareness ratios of the patterned media increased compared to those of the continuous media, probably due to the decrement of a demagnetizing field. Single magnetic domains with an almost perpendicular orientation were confirmed in each magnetic dot.
引用
收藏
页码:1949 / 1951
页数:3
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