Dynamic roughening of tetrahedral amorphous carbon

被引:91
作者
Casiraghi, C [1 ]
Ferrari, AC
Ohr, R
Flewitt, AJ
Chu, DP
Robertson, J
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[2] IBM STD, D-55131 Mainz, Germany
[3] Cambridge Res Lab Epson, Cambridge CB4 0FE, England
关键词
D O I
10.1103/PhysRevLett.91.226104
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The roughness of tetrahedral amorphous carbon (ta-C) films grown at room temperature is measured as a function of film thickness by atomic force microscopy, to extract roughness and growth exponents of alphasimilar to0.39 and betasimilar to0-0.1, respectively. This extremely small growth exponent shows that some form of surface diffusion and relaxation operates at a homologous temperature of 0.07, much lower than in any other material. This is accounted for by a Monte Carlo simulation, which assumes a smoothening during a thermal spike, following energetic ion deposition. The low roughness allows ta-C to be used as an ultrathin protective coating on magnetic disk storage systems with similar to1 Tbit/in.(2) storage density.
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页数:4
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