Growth of epitaxial anatase (001) and (101) films

被引：90

作者：

Herman, GS ^{[1
]}

Gao, Y ^{[1
]}

机构：

[1] Pacific NW Natl Lab, Environm Mol Sci Lab, Richland, WA 99352 USA

来源：

THIN SOLID FILMS | 2001年 / 397卷 / 1-2期

关键词：

anatase TiO2; molecuar beam epitaxy; segregation; titanium oxides;

D O I：

10.1016/S0040-6090(01)01476-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Anatase (TiO2) films have been grown by oxygen plasma assisted molecular beam epitaxy. Reflection high-energy electron diffraction and low energy electron diffraction indicate that the films grow epitaxially with respect to the substrate. For (001) anatase films grown on SrTiO3 (001) we have found that a (1 X 4) reconstruction is formed under growth conditions. On cooling to room temperature this reconstruction remains. The (101) anatase films were grown on a natural anatase (101) substrate. The natural substrate (i.e., mineral) was used due to the difficulty in obtaining good lattice matched materials for this surface orientation. X-Ray photoelectron spectroscopy results indicate that both surfaces are fully oxidized with Ti in the 4+ oxidation state. (C) 2001 Elsevier Science BN. All rights reserved.

引用

页码：157 / 161

页数：5

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