Refinement of PLAS samples by using AFM image and first observation of PLAS signals on amorphous carbon nitride a-CNx films

被引：2

作者：

Furukawa, H ^{[1
]}

Nitta, S ^{[1
]}

Hioki, M ^{[1
]}

Iwasaki, T ^{[1
]}

Itoh, T ^{[1
]}

Nonomura, S ^{[1
]}

机构：

[1] Gifu Univ, Dept Elect Engn, Gifu 50111, Japan

来源：

AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998 | 1998年 / 507卷

关键词：

D O I：

10.1557/PROC-507-465

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The shape of several waveguide end of samples for photoluminescence absorption spectroscopy (PLAS) was studied by atomic force microscope (AFM), because there was an experimental problem where some samples for PLAS did not work. Using the result of AFM, the waveguide end was reshaped by plasma dry etching. The shortening of the etching time was an effective method to improve the structure of the waveguide end. Secondly, the PLAS method was extended to the other materials from a-Si:H. The PLAS signal of amorphous carbon nitride a-CNx was detected for the first time. Amorphous carbon nitride a-CNx film itself and the interface between a-CNx and a-SiO2 are found as good as a-Si:H and the interface between a-Si:H and a-Si3N4+x:H, respectively.

引用

页码：465 / 470

页数：6

共 11 条

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[2]

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