Fabrication of Ti/TiO2/MOx electrodes using photoelectrodeposition technique

被引:7
作者
Matsumoto, Y
Noguchi, M
Matsunaga, T
Kamada, K
Koinuma, M
Yamada, S
机构
[1] Kumamoto Univ, Fac Engn, Dept Appl Chem, Kumamoto 8608555, Japan
[2] Teikyo Univ, Sch Sci & Engn, Dept Mat Sci & Engn, Utsunomiya, Tochigi 3208551, Japan
关键词
titanium dioxide film; electrodeposition; lead dioxide; ruthenium oxide;
D O I
10.5796/electrochemistry.69.314
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Photoelectrochemical deposition of metallic oxide (PbO2, RuOx, NiOOH, and CoOOH) onto a Ti substrate was studied and the electrochemical behavior of the prepared Ti/TiO2/MOx electrodes was examined. The photoelectrochemical deposition of MOx occurred in the solutions containing Mn+ ions on the Ti substrate under anodic bias. Electron holes produced on the TiO2 film surface under illumination may contribute the MOx formation. The prepared Ti/TiO2 /MOx electrodes showed a tunneling current under anodic bias.
引用
收藏
页码:314 / 318
页数:5
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