Sensitivity analysis of ellipsometry applied to uniaxial optical films

被引：13

作者：

Flueraru, C

Schrader, S

Motschmann, H

Zauls, V

机构：

[1] Max Planck Inst Interfaces & Colloids, D-12489 Berlin, Germany

[2] Univ Potsdam, D-14469 Potsdam, Germany

来源：

THIN SOLID FILMS | 2000年 / 379卷 / 1-2期

关键词：

anisotropy; computer simulation; ellipsometry; organic substances;

D O I：

10.1016/S0040-6090(00)01195-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A quantitative study of the sensitivity of ellipsometry applied to uniaxial optical films is reported. A general formalism for optimization of the sensitivity for a layered sample has been developed which is based on a combined variation of wavelength and angle of incidence of the probe beam. For the air/oligophenylenevinylene(OPV5)/crystalline silicon system a numerical calculation is performed to determine sensitivity of ellipsometric angles and correlation of variables. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：15 / 22

页数：8

共 14 条

[1]

Azzam R., 1977, ELLIPSOMETRY POLARIZ

[2]

BAIER U, 1996, THESIS U MAINZ GERMA

[3] Determination of the dielectric function of strongly anisotropic crystals in reflection [J].