DNA shadow nanolithography

The use of surface aligned DNA molecules as shadow-mask templates in a new nanolithography approach with spatial resolution in the sub-10 nm range is analyzed. The DNA serves as a 'nanostencil' that patterns the films when thin metal films are vapor deposited at an appropriate angle on these DNA-bearing substrates. Such shadow patterns can then be transferred into the underlying substrate as trenches using mainstream microfabrication techniques such as reaction ion etching. DNA patterns of varied complexity can be transferred to a substrate with high fidelity, and post process in parallel by standard chemical or microfabrication methods to add functionality to the nanofabricated structures. The formation of the high-aspect-ratio trenches, enclosed nanochannels, and continuous metal lines on silicon by DSN was also analyzed. These nanostructures could find use in applications such as nanofluidic channels or chemical sensors.