Single-walled carbon nanotubes as shadow masks for nanogap fabrication

被引:16
作者
De Poortere, EP [1 ]
Stormer, HL
Huang, LM
Wind, SJ
O'Brien, S
Huang, M
Hone, J
机构
[1] Columbia Univ, Dept Phys, New York, NY 10027 USA
[2] Columbia Univ, Ctr Elect Transport Mol Nanostruct, New York, NY 10027 USA
[3] Columbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA
[4] Columbia Univ, Dept Mech Engn, New York, NY 10027 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2192636
中图分类号
O59 [应用物理学];
学科分类号
摘要
We describe a technique for fabricating nanometer-scale gaps in Pt wires on insulating substrates, using individual single-walled carbon nanotubes as shadow masks during metal deposition. More than 80% of the devices display current-voltage dependencies characteristic of direct electron tunneling. Fits to the current-voltage data yield gap widths in the 0.8-2.3 nm range for these devices, dimensions that are well suited for single-molecule transport measurements.
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页数:3
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