Film density dependence of polymethylmethacrylate ablation under synchrotron radiation irradiation

被引：5

作者：

Fujimura, T ^{[1
]}

Kuroki, Y

Hisakado, T

Ikeda, A

Hattori, R

Hakiai, Y

Hidaka, M

Choi, JY

Chang, SS

机构：

[1] Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Dept Elect, Fukuoka 8128581, Japan

[2] Kyushu Univ, Grad Sch Sci, Dept Phys, Fukuoka 8128581, Japan

[3] POSTECH, Pohang Accelerator Lab, Pohang 790784, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 2A期

关键词：

PMMA; synchrotron radiation; refractive index; ablation; self-developing;

D O I：

10.1143/JJAP.40.916

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Variations in the etch depth and refractive index of polymethylmethacrylate (PMMA) films of different molecular weights after synchrotron radiation (SR) irradiation are investigated. Reduction of the PMMA film molecular weight, density and thickness am observed after SR irradiation. The amount of film thickness loss depends on not only initial molecular weight but also film density. The PMMA density difference at the start of SR exposure affects the etch depth after SR ablation.

引用

页码：916 / 917

页数：2

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