The high pressure plasma source for the surface treatment technology based on the torch discharge stabilized by working gas flow

被引：13

作者：

Kapicka, V

Klima, M

Vaculik, R

Brablec, A

Slavicek, P

Strecha, M

Sicha, M

机构：

[1] Masaryk Univ, Fac Sci, Dept Phys Elect, CS-61137 Brno, Czech Republic

[2] Charles Univ, Fac Math & Phys, Dept Elect & Vacuum Phys, CR-18000 Prague 8, Czech Republic

来源：

CZECHOSLOVAK JOURNAL OF PHYSICS | 1998年 / 48卷 / 10期

关键词：

D O I：

10.1023/A:1022853900585

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The RF torch discharge has been described as a source of the plasma channel. The advantage of this system is that it is possible to use it up to atmospheric pressure for surface coating. The torch discharge works even in the liquid environment.

引用

页码：1161 / 1166

页数：6

共 9 条

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[8]

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[9]

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