Synthesis and measurement of Os-Si multilayer mirrors optimized for the wavelength 380 angstrom

被引：8

作者：

Kozhevnikov, IV ^{[1
]}

Balakireva, LL ^{[1
]}

Fedorenko, AI ^{[1
]}

Kopealets, IA ^{[1
]}

Levashov, VE ^{[1
]}

Stetsenko, AN ^{[1
]}

Struk, II ^{[1
]}

Vinogradov, AV ^{[1
]}

机构：

[1] KHARKOV POLYTECH UNIV,KHARKOV 310002,UKRAINE

来源：

OPTICS COMMUNICATIONS | 1996年 / 125卷 / 1-3期

关键词：

D O I：

10.1016/0030-4018(95)00713-X

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Flat and spherical Os-Si multilayer mirrors were synthesized and studied. Measured normal incidence reflectivity was 20% at the wavelength lambda = 380 Angstrom. The effect of impurities in silicon layers on the multilayer reflectivity in ultra soft X-ray region is discussed.

引用

页码：13 / 17

页数：5

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