Influence of atmospheric exposure of tris (8-hydroxyquinoline) aluminum (Alq3):: a photoluminescence and absorption study

被引：38

作者：

Djurisic, AB

Lau, TW

Lam, LSM

Chan, WK

机构：

[1] Univ Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R China

[2] Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China

[3] Univ Hong Kong, Dept Chem, Hong Kong, Hong Kong, Peoples R China

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2004年 / 78卷 / 03期

关键词：

D O I：

10.1007/s00339-002-1915-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have investigated the effects of atmospheric exposure on the properties of tris (8-hydroxyquinoline) aluminum (Alq(3)) thin films by photoluminescence (PL) and UV-Vis absorption measurements. Alq(3) films were evaporated on glass substrates at different temperatures. The influence of annealing on the environmental stability of the films has also been investigated. It has been found that deposition at higher substrate temperature and annealing of the samples deposited at room temperature yield an improvement in the environmental stability of the films, i.e. less decrease in the PL intensity over time with exposure to atmosphere, as well as increased PL intensity. To investigate further the effects of the air exposure, films deposited at room temperature were stored for four days in air, nitrogen, and oxygen. No decrease in PL intensity has been found for storage in nitrogen, while the decrease for the film stored in oxygen was smaller than that for the film stored in air, indicating that both humidity and oxygen play a role in the PL intensity decrease in Alq(3) thin films.

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页码：375 / 380

页数：6

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