Preparation of Ti-Al-N electrode films by pulsed laser ablation for lead-zirconate-titanate film capacitors

被引：6

作者：

Morimoto, A

Yamanaka, Y

Shimizu, T

机构：

[1] Kanazawa Univ, Kanazawa

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1996年 / 35卷 / 2B期

关键词：

Ti-Al-N electrode; ferroelectric thin films; Pb(Zr0.52Ti0.48)O-3; PZT; pulsed laser ablation; PLA; PLD;

D O I：

10.1143/JJAP.35.L227

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Titanium-aluminum-nitride (Ti-Al-N; TAN) electrode films were prepared by pulsed laser ablation on (100)Si and (100)MgO substrates for ferroelectric lead-zirconate-titanate (Pb(Zr0.52Ti0.48)O-3; PZT) thin-film capacitors. Capacitors with rather randomly oriented PZT films on the TAN/(100)Si did not show a ferroelectric hysteresis loop: but the capacitor with preferentially [100]-oriented PZT film on the TAN/(100)MgO did. This suggests that a TAN-electrode film was grown on (10O)MgO with a high oxidation resistance at the high temperature employed for ferroelectric oxide preparation.

引用

页码：L227 / L230

页数：4

共 19 条

[1]

BRUCHHAUS R, 1992, MATER RES SOC S P, V243, P123

[2] SWITCHING KINETICS OF PB(ZR, TI)O3 THIN-FILMS GROWN BY CHEMICAL-VAPOR-DEPOSITION [J].

KATAYAMA, T ;

SHIMIZU, M ;

SHIOSAKI, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1993, 32 (9A) :3943-3949

[3] FERROELECTRIC PROPERTIES OF LEAD-ZIRCONATE-TITANATE FILMS PREPARED BY LASER ABLATION [J].

KIDOH, H ;

OGAWA, T ;

MORIMOTO, A ;

SHIMIZU, T .

APPLIED PHYSICS LETTERS, 1991, 58 (25) :2910-2912

[4] PREPARATION OF PB(ZR, TI)O3 FILMS ON SI SUBSTRATE BY LASER ABLATION [J].

KIDOH, H ;

OGAWA, T ;

YASHIMA, H ;

MORIMOTO, A ;

SHIMIZU, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (9B) :2965-2967

[5]

KINGON AI, 1991, 3RD P INT S INT FERR, P658

[6] POLARIZATION FATIGUE CHARACTERISTICS OF SOL-GEL FERROELECTRIC PB(ZR0.4TI0.6)O3 THIN-FILM CAPACITORS [J].

MIHARA, T ;

WATANABE, H ;

DEARAUJO, CAP .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7A) :3996-4002

[7] ANNEALING TEMPERATURE-DEPENDENCE OF MGO SUBSTRATES ON THE QUALITY OF YBA2CU3OX FILMS PREPARED BY PULSED-LASER ABLATION [J].

MINAMIKAWA, T ;

SUZUKI, T ;

YONEZAWA, Y ;

SEGAWA, K ;

MORIMOTO, A ;

SHIMIZU, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (8A) :4038-4042

[8] FATIGUE BEHAVIOR IN LEAD-ZIRCONATE-TITANATE THIN-FILM CAPACITORS PREPARED BY PULSED-LASER ABLATION ON NI-ALLOY ELECTRODES [J].

MORIMOTO, A ;

YAMANAKA, Y ;

SHIMIZU, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (8A) :4108-4113

[9] EPITAXIAL-GROWTH OF TIN FILMS ON (100) SILICON SUBSTRATES BY LASER PHYSICAL VAPOR-DEPOSITION [J].

NARAYAN, J ;

TIWARI, P ;

CHEN, X ;

SINGH, J ;

CHOWDHURY, R ;

ZHELEVA, T .

APPLIED PHYSICS LETTERS, 1992, 61 (11) :1290-1292

[10]

Ogawa T., 1992, MATER RES SOC S P, V243, P93

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