Microstructural characteristics of conductive SrRuO3 thin films formed by pulsed-laser deposition

被引:19
作者
Lu, P [1 ]
Chu, F
Jia, QX
Mitchell, TE
机构
[1] New Mexico Inst Min & Technol, Dept Mat Sci & Engn, Socorro, NM 87801 USA
[2] Univ Calif Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA
关键词
D O I
10.1557/JMR.1998.0321
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transmission electron microscopy and high-resolution electron microscopy have been used to study microstructural properties of conductive SrRuO3 films grown by pulsed laser deposition on (001) LaAlO3 and (001) SrTiO3 substrates. It was found that the SrRuO3 films deposited on both substrates consist of mixed domains of [001] and [110] orientations, with orientation relationships that can be described as (i) (001)(f) parallel to (001)(s) and [110](f) parallel to [100](s) and (ii) (110)(f) parallel to (001)(s) and [001](f) parallel to [100](s), respectively. The SrRuO3 films deposited on SrTiO3, in particular, were found to have a layered domain structure, with the [110] domain grown initially on the substate, followed by growth of the [001] oriented domain with increasing thickness. The films on SrTiO3 are strained and have a coherent interface with the substrate. The SrRuO3 films deposited on LaAlO3, on the other hand, contain a high density of structural defects such as stacking faults and microtwins on the (022) planes. Microtwins as large as 50 nm in thickness are observed in the films deposited on LaAlO3. Possible causes for the observed structural defects in the films are discussed.
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页码:2302 / 2307
页数:6
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