Isovalent impurity-vacancy complexes in germanium

被引:65
作者
Chroneos, A. [1 ]
机构
[1] Imperial Coll London, Dept Mat, London SW7 2BP, England
[2] NCSR Demokritos, Inst Microelect, Aghia Paraskevi 15310, Greece
来源
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 2007年 / 244卷 / 09期
关键词
D O I
10.1002/pssb.200642622
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Electronic structure simulations are used to predict the structures and relative energies of clusters formed between isovalent impurities and lattice vacancies in germanium and for comparison in silicon. The structures and relative energies of a series of different carbon-vacancy complexes in germanium are considered. The technique is also used to predict the effect of carbon atoms on the binding of tin-vacancy pairs in germanium. For germanium and silicon different configurations containing carbon, tin and vacancies are stable. The calculations highlight important differences in the stability of clusters in germanium compared to silicon.
引用
收藏
页码:3206 / 3210
页数:5
相关论文
共 25 条
[1]   First-shell bond lengths in SixGe1-x crystalline alloys [J].
Aubry, JC ;
Tyliszczak, T ;
Hitchcock, AP ;
Baribeau, JM ;
Jackman, TE .
PHYSICAL REVIEW B, 1999, 59 (20) :12872-12883
[2]   LATTICE CONSTANTS + THERMAL EXPANSIVITIES OF SILICON + OF CALCIUM FLUORIDE BETWEEN 6 DEGREES + 322 DEGREES K [J].
BATCHELDER, DN ;
SIMMONS, RO .
JOURNAL OF CHEMICAL PHYSICS, 1964, 41 (08) :2324-&
[3]  
BRACHT H, 2006, 2 INT WORKSH COORD A
[4]   TIN AS A VACANCY TRAP IN SILICON AT ROOM-TEMPERATURE [J].
BRELOT, A .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1972, NS19 (06) :220-223
[5]   Atomic scale simulations of arsenic-vacancy complexes in germanium and silicon [J].
Chroneos, A. ;
Grimes, R. W. ;
Tsamis, C. .
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2006, 9 (4-5) :536-540
[6]   Implantation and diffusion of phosphorous in germanium [J].
Chroneos, A. ;
Skarlatos, D. ;
Tsamis, C. ;
Christofi, A. ;
McPhail, D. S. ;
Hung, R. .
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2006, 9 (4-5) :640-643
[7]   Atomic scale simulations of donor-vacancy pairs in germanium [J].
Chroneos, A. ;
Grimes, R. W. ;
Tsamis, C. .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2007, 18 (07) :763-768
[8]  
CHRONEOS A, 2007, IN PRESS J MAT SCI M
[9]   Optimized hydrogen positions for aluminium and iron containing hydroxide minerals [J].
Chroneos, Alexander ;
Ashley, Nicholas J. ;
Desai, Kaajal H. ;
Maguire, John F. ;
Grimes, R. W. .
JOURNAL OF MATERIALS SCIENCE, 2007, 42 (06) :2024-2029
[10]   Early stage donor-vacancy clusters in germanium [J].
Coutinho, Jose ;
Torres, Vitor J. B. ;
Oberg, Sven ;
Carvalho, Alexandra ;
Janke, Colin ;
Jones, Robert ;
Briddon, Patrick R. .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2007, 18 (07) :769-773