Micropolarizer array for infrared imaging polarimetry

被引:227
作者
Nordin, GP [1 ]
Meier, JT
Deguzman, PC
Jones, MW
机构
[1] Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA
[2] Nichols Res Corp, Syst Dev & Evaluat Ctr, Huntsville, AL 35815 USA
来源
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION | 1999年 / 16卷 / 05期
关键词
D O I
10.1364/JOSAA.16.001168
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The design and fabrication of a micropolarizer array for imaging polarimetry is described for the 3-5-mu m-wavelength region. Each micropolarizer consists of a 475-nm-period Mo wire grid in a 16 mu m x 16 mu m aperture. Interference lithography is used to generate the small grating features through an etch mask layer. Arrays of 256 x 256 micropolarizers at three distinct angular orientations have been fabricated that permit the measurement of the first three Stokes vector components in each pixel of an imaging polarimeter. An imaging system composed of a micropolarizer array integrated directly onto a focal plane array has been assembled, and initial testing has been performed. (C) 1999 Optical Society of America [S0740-3232(99)01905-5].
引用
收藏
页码:1168 / 1174
页数:7
相关论文
共 14 条
[1]  
[Anonymous], OPTICS
[2]   THE WIRE GRID AS A NEAR-INFRARED POLARIZER [J].
BIRD, GR ;
PARRISH, M .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1960, 50 (09) :886-891
[3]  
BORN M, 1986, PRINCIPLES OPTICS, P554
[4]   HIGH-EFFICIENCY METALLIC DIFFRACTION GRATINGS FOR LASER APPLICATIONS [J].
BOYD, RD ;
BRITTEN, JA ;
DECKER, DE ;
SHORE, BW ;
STUART, BC ;
PERRY, MD ;
LI, LF .
APPLIED OPTICS, 1995, 34 (10) :1697-1706
[5]  
CHAMPETIER RJ, 1974, TR74202 SAMSO AER CO
[6]  
CHUN CSL, 1994, P SOC PHOTO-OPT INS, V2234, P275, DOI 10.1117/12.181025
[7]   Fabrication of high-resolution micropolarizer arrays [J].
Guo, JP ;
Brady, DJ .
OPTICAL ENGINEERING, 1997, 36 (08) :2268-2271
[8]   Use of Fourier series in the analysis of discontinuous periodic structures [J].
Li, LF .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1996, 13 (09) :1870-1876
[9]   FORMATION OF HOLOGRAPHIC DIFFRACTION GRATINGS IN PHOTORESIST [J].
MASHEV, L ;
TONCHEV, S .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1981, 26 (03) :143-149
[10]   STABLE IMPLEMENTATION OF THE RIGOROUS COUPLED-WAVE ANALYSIS FOR SURFACE-RELIEF GRATINGS - ENHANCED TRANSMITTANCE MATRIX APPROACH [J].
MOHARAM, MG ;
POMMET, DA ;
GRANN, EB ;
GAYLORD, TK .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1995, 12 (05) :1077-1086