AFM studies of polycrystalline calcium sulfide thin films grown by atomic layer deposition

被引：22

作者：

Dey, S ^{[1
]}

Yun, SJ

机构：

[1] Acad Sinica, Inst Phys, Surface Phys Grp, Taipei 11529, Taiwan

[2] Microelect Technol Lab, Taejon 305600, South Korea

来源：

APPLIED SURFACE SCIENCE | 1999年 / 143卷 / 1-4期

关键词：

ALD; CaS; Al2O3 on Si; AFM; polycrystalline film;

D O I：

10.1016/S0169-4332(98)00624-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Polycrystalline CaS thin films were grown on Al2O3 films deposited on Si-wafer using the atomic layer deposition (ALD) technique. The surface structure of these films was studied by AFM and compared with respective SEM images. The polycrystalline film surfaces comprise regular shaped crystallites. First report of a possible growth mechanism is presented, on studying the variation of morphological features (i.e., roughness and size of crystallites) with thickness and growth rate. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：191 / 200

页数：10

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