Thickness and strain effects on electronic structures of transition metal dichalcogenides: 2H-M X2 semiconductors (M = Mo, W; X = S, Se, Te)

被引:1180
作者
Yun, Won Seok [1 ,2 ,3 ]
Han, S. W. [1 ,2 ]
Hong, Soon Cheol [1 ,2 ]
Kim, In Gee [3 ]
Lee, J. D. [4 ,5 ]
机构
[1] Univ Ulsan, Dept Phys, Ulsan 680749, South Korea
[2] Univ Ulsan, Energy Harvest Storage Res Ctr, Ulsan 680749, South Korea
[3] Pohang Univ Sci & Technol, Grad Inst Ferrous Technol, Pohang 790784, South Korea
[4] Japan Adv Inst Sci & Technol, Sch Mat Sci, Nomi, Ishikawa 9231292, Japan
[5] Japan Adv Inst Sci & Technol, Res Ctr Integrated Sci, Nomi, Ishikawa 9231292, Japan
基金
新加坡国家研究基金会;
关键词
D O I
10.1103/PhysRevB.85.033305
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using the first-principles calculations, we explore the electronic structures of 2H-M X-2 (M = Mo, W; X = S, Se, Te). When the number of layers reduces to a single layer, the indirect gap of bulk becomes a direct gap with larger gap and the band curvatures are found to lead to the drastic changes of effective masses. On the other hand, when the strain is applied on the single layer, the direct gap becomes an indirect gap and the effective masses vary. Especially, the tensile strain reduces the gap energy and effective masses while the compressive strain enhances them. Furthermore, the much larger tensile stress leads to become
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页数:5
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