Amorphous SiO2 precipitates at silicon grain boundaries

被引:4
作者
Duscher, G [1 ]
Mullejans, H [1 ]
Werner, J [1 ]
Ruhle, M [1 ]
机构
[1] MAX PLANCK INST FESTKORPERFORSCH,D-70569 STUTTGART,GERMANY
来源
INTERGRANULAR AND INTERPHASE BOUNDARIES IN MATERIALS, PT 2 | 1996年 / 207-卷
关键词
Si; SiO2; grain boundary; precipitate; electrical activity; EELS;
D O I
10.4028/www.scientific.net/MSF.207-209.713
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The structure and chemistry of a Sigma 33 grain boundary in a Si bicrystal were investigated as a function of thermal treatments. Amorphous SiO2 precipitates were found at the grain boundary. The precipitate interfaces are the {111} planes of the two crystals forming the boundary. The precipitate-crystal interfaces were studied by analytical transmission electron microscopy. The electronic states of the interfaces between the amorphous precipitates and the Si crystals are similar to those at the interface between Si and thermally grown SiO2 film. The electrical activity of the grain boundaries can be explained;based on these observations.
引用
收藏
页码:713 / 716
页数:4
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