Optimization of bent perfect Si(220)-crystal monochromator for residual strain/stress instrument - Part II

被引:12
作者
Moon, MK
Em, VT
Lee, CH
Mikula, P
Hong, KP
Choi, YH
Cheon, JK
Nam, UW
Kong, KN
Jin, KC
机构
[1] Korea Atom Energy Res Inst, Neutron Beam Appl, Taejon 305600, South Korea
[2] Acad Sci Czech Republ, Inst Nucl Phys, CZ-25068 Rez, Czech Republic
[3] Res Ctr Rez Ltd, CZ-25068 Rez, Czech Republic
[4] Korea Astron Observ, Taejon 305348, South Korea
[5] Korea Inst Ind Technol, Cheonan 330825, Chungnam, South Korea
关键词
neutron monochromator; residual stress measurement; bent perfect crystal; neutron diffraction;
D O I
10.1016/j.physb.2005.06.044
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Optimized diffractometer arrangements for residual strain measurements employing curved crystal monochromators provide good luminosity and a high Delta d/d resolution in the vicinity of usually used scattering angle 2 theta(S) 90 degrees. Due to a variety of designs of the diffractometers which could be installed at a constant or different take-off angles, except a few attempts, there is a lack of experimental evidence providing a help in a choice of parameters for an optimum performance. In addition to our earlier investigations with curved Si(311) monochromator employed in different diffraction geometries (see paper I [M.K. Moon et al., Physica B, submitted [1]]), the present paper presents the monochromator properties of cylindrically bent perfect Si(220) crystals as another candidate to be used as monochromator in residual strain diffractometers. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:70 / 75
页数:6
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