Curve fitting in surface analysis and the effect of background inclusion in the fitting process

被引：60

作者：

Sherwood, PMA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 03期

关键词：

D O I：

10.1116/1.579964

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

An overview is presented of data analysis methods that can be used in surface analysis, especially those that can be used in x-ray photoelectron spectroscopy (XPS). The paper provides illustrations of the application of data analysis methods to real systems, and discusses practical problems that can arise when working with real data sets. The paper focuses upon curve fitting of core XPS data, and discusses the importance of combining curve fitting information with other supporting information and experiments. The effect of different backgrounds incorporated into the fitting process is discussed. (C) 1996 American Vacuum Society.

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页码：1424 / 1432

页数：9

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