MxL: Pseudo-maskless, high-throughput nanolithography

被引:9
作者
Schaper, CD [1 ]
机构
[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
来源
EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2 | 2003年 / 5037卷
关键词
nanolithography; maskless lithography; imprint lithography; soft lithography;
D O I
10.1117/12.484420
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A novel chemical procedure is described that presents, for the first time, a dissolvable template (as opposed to a hard or soft template) for printing. The method, called Molecular Transfer Lithography (MxL), is a pseudo-maskless approach to high-throughput fabrication of devices over large areas with feature sizes that can extend below 100 nm. The MxL procedure utilizes a chemical process that replicates the surface topography of a master pattern into soluble polymeric templates. The template is dissolvable in water but not most organic materials. This property of differential solubility is useful for transferring topography or functional materials onto substrate surfaces. The template is generally chemically dissolved at the conclusion of the pattern formation process. The paper presents a variety of printing strategies and results including lines at 53 urn, three-dimensional patterns, 250 rim contact hole levels, diffraction and optical structures and 200 turn wafer printing. The technique is also useful for planarization. Multi-level printing is achieved by integration of the MxL process and dissolvable templates with standard contact aligners.
引用
收藏
页码:538 / 549
页数:12
相关论文
共 21 条
[1]   Step and flash imprint lithography: An efficient nanoscale printing technology [J].
Bailey, TC ;
Johnson, SC ;
Sreenivasan, SV ;
Ekerdt, JG ;
Willson, CG ;
Resnick, DJ .
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (03) :481-486
[2]   All-additive fabrication of inorganic logic elements by liquid embossing [J].
Bulthaup, CA ;
Wilhelm, EJ ;
Hubert, BN ;
Ridley, BA ;
Jacobson, JM .
APPLIED PHYSICS LETTERS, 2001, 79 (10) :1525-1527
[3]   A prototype two-dimensional capillary electrophoresis system fabricated in poly(dimethylsiloxane) [J].
Chen, XX ;
Wu, HK ;
Mao, CD ;
Whitesides, GM .
ANALYTICAL CHEMISTRY, 2002, 74 (08) :1772-1778
[4]   Design of orientation stages for step and flash imprint lithography [J].
Choi, BJ ;
Sreenivasan, SV ;
Johnson, S ;
Colburn, M ;
Wilson, CG .
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2001, 25 (03) :192-199
[5]   Ultrafast and direct imprint of nanostructures in silicon [J].
Chou, SY ;
Keimel, C ;
Gu, J .
NATURE, 2002, 417 (6891) :835-837
[6]   Imprint lithography with sub-10 nm feature size and high throughput [J].
Chou, SY ;
Krauss, PR .
MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) :237-240
[7]   Imprint lithography with 25-nanometer resolution [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
SCIENCE, 1996, 272 (5258) :85-87
[8]  
Colburn M, 2001, SOLID STATE TECHNOL, V44, P67
[9]   Fabrication of magnetic microfiltration systems using soft lithography [J].
Deng, T ;
Prentiss, M ;
Whitesides, GM .
APPLIED PHYSICS LETTERS, 2002, 80 (03) :461-463
[10]   Patterning Sub-50 nm features with near-field embedded-amplitude masks [J].
Goodberlet, JG ;
Kavak, H .
APPLIED PHYSICS LETTERS, 2002, 81 (07) :1315-1317