Additive fabrication and the mechanisms of nucleation and growth in chemical vapor deposition processes

被引:11
作者
Crane, EL
Girolami, GS [1 ]
Nuzzo, RG
机构
[1] Univ Illinois, Sch Chem Sci, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
关键词
D O I
10.1021/ar960102n
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In this Account, we present several representative studies of thin-film growth by chemical vapor deposition, with particular emphasis given to elucidating the mechanistic, energetic, and structural aspects of nucleation and growth. These understandings have allowed us to develop new methods to deposit patterned, as opposed to blanket, thin films. We show how such procedures can be exploited to effect the directed assembly (i.e., the additive fabrication) of a device architecture.
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页码:869 / 877
页数:9
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