Single-step fabrication of surface relief diffractive optical elements on hybrid sol-gel glass

被引：7

作者：

Jiang, HJ ^{[1
]}

Yuan, XC ^{[1
]}

Lam, YL ^{[1
]}

Chan, YC ^{[1
]}

Ng, GI ^{[1
]}

机构：

[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore

来源：

OPTICAL ENGINEERING | 2001年 / 40卷 / 09期

关键词：

ultraviolet sensitive; hybrid sol-gel glass; high-energy-beam-sensitive glass mask; diffractive optical elements;

D O I：

10.1117/1.1396838

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Binary and continuous phase-only surface relief diffractive, optical elements can be fabricated on hybrid sol-gel glass based on a single-step microfabrication process. We report on the fabrication and characterization of an inorganic-organic hybrid SiO2/TiO2 sol-gel glass by UV light exposure. Preliminary results of binary and continuous surface relief structures fabricated on sol-gel glass with UV exposure using holographic technique and a high-energy-beam-sensitive (HEBS) glass mask are demonstrated. The effects of the fabrication parameters such as doping concentration, bake temperature, and UV light exposure time on the film characteristics (thickness and refractive index) are studied. (C) 2001 Society of Photo-Optical Instrumentation Engineers.

引用

页码：2017 / 2021

页数：5

共 15 条

[1] Diffraction gratings in sol-gel films by direct contact printing using a UV-mercury lamp [J].

Äyräs, P ;

Rantala, JT ;

Honkanen, S ;

Mendes, SB ;

Peyghambarian, N .

OPTICS COMMUNICATIONS, 1999, 162 (4-6) :215-218

[2] Gratings fabrication by ultraviolet light imprinting and embossing in a sol-gel silica glass [J].

Chisham, JE ;

Andrews, MP ;

Li, CY ;

Najafi, SI ;

MalekTabrizi, A .

FUNCTIONAL PHOTONIC AND FIBER DEVICES, 1996, 2695 :52-56

[3] Sol-gel channel waveguide on silicon: fast direct imprinting and low cost fabrication [J].

Coudray, P ;

Etienne, P ;

Moreau, Y ;

Porque, J ;

Najafi, SI .

OPTICS COMMUNICATIONS, 1997, 143 (4-6) :199-202

[4] Novel photorefractive sol-gel materials [J].

Darracq, B ;

Chaput, F ;

Lahlil, K ;

Boilot, JP ;

Levy, Y ;

Alain, V ;

Ventelon, L ;

Blanchard-Desce, M .

OPTICAL MATERIALS, 1998, 9 (1-4) :265-270

[5] Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass [J].

Daschner, W ;

Long, P ;

Stein, R ;

Wu, C ;

Lee, SH .

APPLIED OPTICS, 1997, 36 (20) :4675-4680

[6] FABRICATION OF CONTINUOUS-RELIEF MICRO-OPTICAL ELEMENTS BY DIRECT LASER WRITING IN PHOTORESISTS [J].

GALE, MT ;

ROSSI, M ;

PEDERSEN, J ;

SCHUTZ, H .

OPTICAL ENGINEERING, 1994, 33 (11) :3556-3566

[7]

Herzig H.P., 1997, Micro-optics: Elements, Systems, and Applications

[8] Analysis and optimization of fabrication of continuous-relief diffractive optical elements [J].

Hessler, T ;

Rossi, M ;

Kunz, RE ;

Gale, MT .

APPLIED OPTICS, 1998, 37 (19) :4069-4079

[9] Diffraction gratings of photosensitive ZrO2 gel films fabricated with the two-ultraviolet-beam interference method [J].

Kintaka, K ;

Nishii, J ;

Tohge, N .

APPLIED OPTICS, 2000, 39 (04) :489-493

[10] SUCCESSIVE DEVELOPMENT OPTIMIZATION OF RESIST KINOFORMS MANUFACTURED WITH DIRECT-WRITING, ELECTRON-BEAM LITHOGRAPHY [J].

LARSSON, M ;

EKBERG, M ;

NIKOLAJEFF, F ;

HARD, S .

APPLIED OPTICS, 1994, 33 (07) :1176-1179

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