The Rossendorf 3 MV tandetron: A new generation of high-energy implanters

At Rossendorf the first 3 MV tandetron (high-current version) has been installed being equipped with a new immersion lens injection system. It completes the existing complex of electrostatic accelerators. A stable operation at terminal voltages of U-t = 0.1-3.3 MV has been obtained. The accelerator is applied mainly for high-energy implantation and materials modification. Some methods of ion beam analysis (RES, AMS and a nuclear microprobe) have been installed which make use of the high stability of energy and beam position. The results of about one year operation are presented.