A novel example of X-ray-radiation-induced chemical reduction of an aromatic nitro-group-containing thin film on SiO2 to an aromatic amine film

被引：91

作者：

Mendes, P

Belloni, M

Ashworth, M

Hardy, C

Nikitin, K

Fitzmaurice, D

Critchley, K

Evans, S

Preece, J

机构：

[1] Univ Birmingham, Sch Chem Sci, Birmingham B15 2TT, W Midlands, England

[2] Univ Birmingham, Sch Engn, Birmingham B15 2TT, W Midlands, England

[3] Univ Coll Dublin, Nanochem Grp, Dept Chem, Nanochem Grp, Dublin 4, Ireland

[4] Univ Leeds, Dept Phys & Astron, Leeds LS2 9JT, W Yorkshire, England

来源：

CHEMPHYSCHEM | 2003年 / 4卷 / 08期

关键词：

chemical modification; organic film; nanostructures; nitro group; SiO2; X-ray photoelectron spectroscopy;

D O I：

10.1002/cphc.200300699

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Reductive rays: X-ray photoelectron spectroscopy was employed to investigate the chemical change in self-assembled films of 3-(4-nitrophenoxy)-propyltrimethoxysilane (NPPTMS) on silicon (Si/SiO 2) wafers upon X-ray irradiation The results indicate conversion of the NO2 group into NH2. In order to confirm this, a self-assembled multilayer of NPPTMS on silicon was subjected to reductive conditions (SnCl2/anhydrous EtOH) to convert the NO2 to the NH2 group. The graphic shows the time-resolved X-ray induced chemical reduction of the thin film on an SiO2 surface.

引用

页码：884 / 889

页数：6

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[1] A NEAR-EDGE X-RAY-ABSORPTION FINE STRUCTURE SPECTROSCOPY AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE FILM PROPERTIES OF SELF-ASSEMBLED MONOLAYERS OF ORGANOSILANES ON OXIDIZED SI(100) [J].