Passivation of Metal Surface States: Microscopic Origin for Uniform Mono layer Graphene by Low Temperature Chemical Vapor Deposition

被引:65
作者
Jeon, Insu [2 ]
Yang, Heejun [1 ]
Lee, Sung-Hoon [1 ]
Heo, Jinseong [1 ]
Seo, David H. [1 ]
Shin, Jaikwang [1 ]
Chung, U-In [1 ]
Kim, Zheong Gou [2 ]
Chung, Hyun-Jong [1 ]
Seo, Sunae [1 ]
机构
[1] Samsung Adv Inst Technol, Semicond Device Lab, Yongin 446712, South Korea
[2] Seoul Natl Univ, Dept Phys & Astron, Seoul 151747, South Korea
关键词
graphene; copper; scanning tunneling microscopy; density functional theory; chemical vapor deposition; EPITAXIAL GRAPHENE; FILMS;
D O I
10.1021/nn102916c
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Scanning tunneling microscopy (STM) and density functional theory (DFT) calculations were used to Investigate the surface morphology and electronic structure of graphene synthesized on Cu by low temperature chemical vapor deposition (CVD). Periodic line patterns originating from the arrangements of carbon atoms on the Cu surface passivate the Interaction between metal substrate and graphene, resulting in flawless inherent graphene band structure in pristine graphene/Cu. The effective elimination of metal surface states by the passivation Is expected to contribute to the growth of monolayer graphene on Cu, which yields highly enhanced uniformity on the wafer scale, making progress toward the commercial application of graphene.
引用
收藏
页码:1915 / 1920
页数:6
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