In situ growth rate measurements and length control during chemical vapor deposition of vertically aligned multiwall carbon nanotubes

被引:121
作者
Geohegan, DB [1 ]
Puretzky, AA
Ivanov, IN
Jesse, S
Eres, G
Howe, JY
机构
[1] Oak Ridge Natl Lab, Condensed Matter Sci Div, Oak Ridge, TN 37831 USA
[2] Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA
[3] Oak Ridge Natl Lab, Div Met & Ceram, Oak Ridge, TN 37831 USA
关键词
D O I
10.1063/1.1605793
中图分类号
O59 [应用物理学];
学科分类号
摘要
Time-resolved reflectivity is employed as an in situ diagnostic in thermal chemical vapor deposition of vertically aligned arrays of multiwall carbon nanotubes (VAA-MWNT). Fabry-Perot interference fringes and attenuation of a reflected HeNe laser beam are used to measure the length of VAA-MWNT throughout the first 3-8 mum of growth yielding in situ measurements of growth rates and kinetics and the capability to observe the onset and termination of growth. VAA-MWNT growth is characterized between 565 and 750 degreesC on Si substrates with evaporated Al/Fe/Mo multilayer catalysts and acetylene feedstock. Nanotube lengths were controlled by rapid evacuation of the chamber at predetermined reflectivities, and it was demonstrated that growth can be restarted at later times. The extinction coefficients of the VAA-MWNT were studied and correlated with nanotube wall structure. Growth rates for VAA-MWNT are found to vary depending on the catalyst preparation, temperature, and time. Both the highest growth rates (0.3 mum/s) and the tallest VAA-MWNT (0.75 mm long) were achieved at 730 degreesC. (C) 2003 American Institute of Physics.
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收藏
页码:1851 / 1853
页数:3
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