Growth behavior of carbon nanotubes on multilayered metal catalyst film in chemical vapor deposition

被引：137

作者：

Cui, H

Eres, G

Howe, JY

Puretkzy, A

Varela, M

Geohegan, DB

Lowndes, DH

机构：

[1] Oak Ridge Natl Lab, Condensed Matter Sci Div, Oak Ridge, TN 37831 USA

[2] Oak Ridge Natl Lab, Div Met & Ceram, Oak Ridge, TN 37831 USA

来源：

CHEMICAL PHYSICS LETTERS | 2003年 / 374卷 / 3-4期

关键词：

D O I：

10.1016/S0009-2614(03)00701-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The temperature and time dependences of carbon nanotube (CNT) growth by chemical vapor deposition are studied using a multilayered Al/Fe/Mo catalyst on silicon substrates. Within the 600-1100 degreesC temperature range of these studies, narrower temperature ranges were determined for the growth of distinct types of aligned multi-walled CNTs and single-walled CNTs by using high-resolution transmission electron microscopy and Raman spectroscopy. At 900 degreesC, in contrast to earlier work, double-walled CNTs are found more abundant than single-walled CNTs. Defects also are found to accumulate faster than the ordered graphitic structure if the growth of CNTs is extended to long durations. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：222 / 228

页数：7

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