Deposition of highly crosslinked fluorinated amorphous carbon film and structural evolution during thermal annealing

被引：83

作者：

Yang, HN ^{[1
]}

Tweet, DJ ^{[1
]}

Ma, YJ ^{[1
]}

Nguyen, T ^{[1
]}

机构：

[1] Sharp Microelect Technol Inc, Camas, WA 98607, Australia

来源：

APPLIED PHYSICS LETTERS | 1998年 / 73卷 / 11期

关键词：

D O I：

10.1063/1.122190

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Highly crosslinked fluorinated amorphous carbon films are obtained by increasing deposition temperature. enhancing ion bombardment, and fine tuning the fluorine-to-carbon ratio. The as-deposited films undergo significant mechanical, chemical, and electrical changes after thermal annealing. Most importantly, these changes occur only at the initial stage of annealing. After the thermal treatment, the films tend to be thermally stable and retain reasonably good electrical properties for use as a low-k dielectric. (C) 1998 American Institute of Physics.

引用

页码：1514 / 1516

页数：3

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