Densified SiOF film formation for preventing water absorption

被引：50

作者：

Kudo, H ^{[1
]}

Shinohara, R ^{[1
]}

Takeishi, S ^{[1
]}

Awaji, N ^{[1
]}

Yamada, M ^{[1
]}

机构：

[1] FUJITSU LABS LTD, ELECTRON DEVICES & MAT LAB, ATSUGI, KANAGAWA 24301, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1996年 / 35卷 / 2B期

关键词：

SiOF; PE-CVD; dielectric constant; water absorption; interlayer dielectric;

D O I：

10.1143/JJAP.35.1583

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We confirmed that the density of a SiOF film was decreased by the addition of C2F6 as a fluorine source. Such a decrease in the density had the most significant effect on the water absorptivity. Densities of the films were controlled by increasing O-2 gas mixture ratios. From the TDS measurements of water desorption and the change in dielectric constants which occurred when the Blm was exposed to atmosphere, we confirmed that the densified films had lower water absorptivity.

引用

页码：1583 / 1587

页数：5

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