NEW DIFFRACTOMETER FOR THIN-FILM STRUCTURE-ANALYSIS UNDER GRAZING-INCIDENCE CONDITION

被引:24
作者
HORII, Y
TOMITA, H
KOMIYA, S
机构
[1] Fujitsu Laboratories Ltd., Atsugi, 243-01
关键词
D O I
10.1063/1.1145978
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We designed and constructed a new x-ray diffractometer under grazing incidence condition. This diffractometer is mainly composed of two goniometers; (1) a goniometer for grazing incidence angle control and (2) a goniometer for a sample rotation. The axes of the goniometers are orthogonal to each other. Furthermore, a detector moves parallel and vertical to the sample surface. Therefore, lattice constants of vertical and parallel components can be identified. We will describe components and accuracy of our designed diffractometer for grazing incidence x-ray diffraction and show applications for TiSi2 (several 10 nm thickness) and GaAs (20 monolayer) on Si. © 1995 American Institute of Physics.
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页码:1370 / 1372
页数:3
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