Growth and characterization of CuxS (x=1.0, 1.76, and 2.0) thin films grown by solution growth technique (SGT)

被引:98
作者
Bagul, S. V.
Chavhan, S. D.
Sharma, Ramphal [1 ]
机构
[1] Dr Babasaheb Ambedkar Marathwada Univ, Dept Phys, Thin Film & Nanotechnol Lab, Aurangabad 431004, Maharashtra, India
[2] GT Patil Coll, Dept Phys, Thin Film & Semicond Lab, Nandurbar 425412, India
关键词
D O I
10.1016/j.jpcs.2007.03.053
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Thin films of CuxS (x = 1.0, 1.76, and 2.0) were grown by solution growth technique (SGT). The deposition parameters such as pH of solution, deposition time, and deposition temperature were optimized. The deposited films were annealed in Ar atmosphere at 250 degrees C. The changes in structural and optical transport phenomenon of annealed films have been studied. The surface morphology and composition of films were studied by SEM micrographs and EDAX analysis, respectively, and the surface roughness was calculated by atomic force microscopy (AFM). The XRD study showed the polycrystalline nature of annealed film. The lattice parameters of different phases of the material were calculated from the XRD pattern. The absorption coefficient varies in the range of 1 x 10(5)-6 x 10(5) cm(-1). The optical bandgaps of CuS, Cu1.76S, and Cu2S are 1.72, 2.11, and 2.48 eV, respectively. (C) 2007 Published by Elsevier Ltd.
引用
收藏
页码:1623 / 1629
页数:7
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