Selective etching of metallic single-wall carbon nanotubes with hydrogen plasma

被引:77
作者
Hassanien, A
Tokumoto, M
Umek, P
Vrbanic, D
Mozetic, M
Mihailovic, D
Venturini, P
Pejovnik, S
机构
[1] AIST, Nanotechnol Res Inst, Tsukuba, Ibaraki 3058568, Japan
[2] Jozef Stefan Inst, Ljubljana 1000, Slovenia
[3] Fac Chem & Chem Technol, Ljubljana 1000, Slovenia
[4] Natl Inst Chem, Ljubljana, Slovenia
关键词
D O I
10.1088/0957-4484/16/2/017
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present Raman scattering and scanning tunnelling microscopy (STM) measurements on hydrogen plasma etched single-wall carbon nanotubes (SWNTs). Interestingly, both the STM and Raman spectroscopy show that the metallic SWNTs are dramatically altered and highly defected by the plasma treatment. In addition, structural characterizations show that metal catalysts are detached from the ends of the SWNT bundles. For semiconducting SWNTs we observe no feature of defects or etching along the nanotubes. Raman spectra in the radial breathing mode region of plasma-treated SWNT material show that most of the tubes are semiconducting. These results show that hydrogen plasma treatment favours etching of metallic nanotubes over semiconducting ones and therefore could be used to tailor the electronic properties of SWNT raw materials.
引用
收藏
页码:278 / 281
页数:4
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